Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1987-07-31
1989-09-05
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430330, 5253265, 522148, G03C 1495, G03C 516, G03F 726
Patent
active
048638340
ABSTRACT:
A sensitive deep utltraviolet radiation resist suitable for use in two layer lithography is obtained by brominating poly (1-trimethylsilylpropyne). Positive patterned layers are obtained by coating a substrate with the polymer, irradiating it with ultraviolet radiation, baking the polymer and developing the irradiated portions.
REFERENCES:
Higashimura, T., et al, Polymer Journal, vol. 17, No. 2, pp. 395-398 (1985).
Baker Gregory L.
Bowden Murrae J. S.
Gozdz Antoni S.
Klausner Cynthia F.
Bell Communications Research Inc.
Falk James W.
Fink Edward M.
Hamilton Cynthia
Michl Paul R.
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