Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-02-07
2006-02-07
Lee, Sin J. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S325000, C430S327000, C430S328000, C430S330000, C430S331000, C430S313000, C430S317000, C430S905000, C430S907000, C430S908000, C430S909000, C430S910000, C430S914000, C430S942000, C526S266000, C526S279000
Reexamination Certificate
active
06994946
ABSTRACT:
Novel silicon-containing polymers are provided comprising recurring units having a POSS pendant and units which improve alkali solubility under the action of an acid. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of up to 300 nm and improved resistance to oxygen plasma etching.
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English abstract of JP-A-2002-192947.
Hatakeyama Jun
Takeda Takanobu
Birch Stewart Kolasch & Birch
Lee Sin J.
Shin-Etsu Chemical Co. , Ltd.
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