Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-09-18
2007-09-18
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S914000
Reexamination Certificate
active
10679782
ABSTRACT:
Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
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Chem. Abstract 134:179709 (English abstract for JP 2001-55512).
Machine-assisted English translation of JP 2001-55512, provided by Japan Patent Office.
Machine-assisted English translation of JP 2002-107938, provided by JPO.
Y. Matzuura, et al., “Synthesis of Polysilane-Acrylic Copolymers by Photopolymerization and Their Application to Positive Resists for EB Lithography”,Journal of Photopolymer Science and Technology, No. 2, 14: 175-180; (2001).
Angelopoulos Marie
Huang Wu-Song
Mahorowila Arpan P.
Moreau Wayne
Pfeiffer Dirk
Abate Esq. Joseph P.
International Business Machines - Corporation
Lee Sin
Scully , Scott, Murphy & Presser, P.C.
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