Silicon-containing antireflective coating forming...

Details Silicon-containing antireflective coating forming... Silicon-containing antireflective coating forming...

2011-03-22

2011-03-22

Hamilton, Cynthia (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C525S474000, C526S245000, C522S148000, C430S272100

Reexamination Certificate

active

07910283

ABSTRACT:
A composition for forming an antireflective coating for use in a photolithography process using exposure light of up to 200 nm comprises a silicon-containing polymer obtained through hydrolytic condensation of a silicon-silicon bond-containing silane compound having formula: R(6-m)Si2Xmwherein R is a monovalent hydrocarbon group, X is alkoxy, alkanoyloxy or halogen, and m is 3 to 6. The composition allows the overlying photoresist film to be patterned to a satisfactory profile and has a high etching selectivity relative to organic material so that a substrate can be processed at a high accuracy.

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