Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-12-05
2000-09-12
McDonald, Rodney
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419222, 427574, 427578, 427583, 427588, 4272481, 42725518, 42725527, 427255393, C23C 1434, C23C 1600
Patent
active
061172839
ABSTRACT:
A silicon coating on an air bearing surface for magnetic thin film heads. A thick silicon layer is provided to replace metallic layers such as TiW as an overcoat for thin film heads. The silicon layer will provide a durable head-disk interface and act as a reflective surface for fly height measurement. The silicon layer can be planarized with the pole tips to avoid any magnetic spacing loss. The thickness of the silicon coating is preferably between 125 and 6500 Angstroms thick. The slider body may be fabricated from silicon such that the silicon coating is substantially identical to the silicon slider body, thereby preventing thermal mismatch therebetween. The silicon coating is preferably applied using a magnetron sputtering technique which provides a high rate of deposition of silicon to form a dense, low stress silicon layer.
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Chen Pei C.
Gorman Grace Lim
Hwang Cherngye
Raman Vedantham
Simmons Randall George
International Business Machines - Corporation
McDonald Rodney
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