Silica microspheres, method of improving attrition resistance

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423584, 501 53, 501 80, 501133, 502261, 502262, C01B 3312

Patent

active

051281147

ABSTRACT:
High-strength, non-agglomerated uniform porous microspheres of silica produced by spray drying a mixture comprising a colloidal silica sol and an additive selected from ammonium citrate or urea; an attrition resistant catalytic composite consisting essentially of metal crystallites such as palladium, platinum-palladium on said silica microsphere and method for preparing the same; and an improved process for making hydrogen peroxide from the direct combination of hydrogen and oxygen in the presence of said attrition resistant catalytic composite.

REFERENCES:
patent: 3301635 (1965-07-01), Bergna et al.
patent: 3591518 (1971-07-01), McMillan
patent: 4010242 (1977-03-01), Iler et al.
patent: 4376724 (1983-03-01), Mita et al.
patent: 4420420 (1983-12-01), Mita et al.
patent: 4832938 (1989-05-01), Gosser et al.
patent: 4913966 (1990-04-01), Garvey et al.
"Adsordents, Catalysts, Supports and Their Manufacture", Jeemusu (1989) Chemical Abstract Japan JP 01307444 (Dec. 12, 1989).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silica microspheres, method of improving attrition resistance does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silica microspheres, method of improving attrition resistance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silica microspheres, method of improving attrition resistance will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1828295

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.