Silica-based antimony containing film-forming composition

Details Silica-based antimony containing film-forming composition Silica-based antimony containing film-forming composition

1987-09-03

1988-12-27

Morris, Theodore

Compositions: coating or plastic

Coating or plastic compositions

Silicon containing other than solely as silicon dioxide or...

10628716, C09K 300

Patent

active

047938625

ABSTRACT:
An improved silica-based film-forming composition for diffusion of antimony in the doping works of semiconductors is proposed which comprises an organic solvent, a partial hydrolysis product of an alkoxy silane compound and an antimony compound dissolved in the organic solvent. The antimony compound in the inventive composition is an alkoxy antimony or aryloxy antimony compound so that the problem of corrosion of the coating apparatus can be entirely avoided without decreasing the dopant concentration in the semiconductor substrate, as well as to provide a film-forming composition which is advantageously stable in storage.

REFERENCES:
patent: 2687399 (1954-08-01), Noll et al.
patent: 3915766 (1975-10-01), Pollack et al.
patent: 4361691 (1982-11-01), Yajima et al.

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