Silane electron beam resists

Details Silane electron beam resists Silane electron beam resists

1979-02-15

1980-12-02

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 427 43, 427 44, 20415913, G03C 171, G03C 500, C08F 246, C08F 3008, C08G 7700

Patent

active

042372089

ABSTRACT:
Recording media comprising a film of a polymer having a repeating unit of the formula ##STR1## wherein R is an alkyl or acyl group and n is an integer are suitable for recording information with electron beams.

REFERENCES:
patent: 3113896 (1963-12-01), Mann
patent: 3758306 (1973-09-01), Roos
patent: 3877980 (1975-04-01), Martin et al.
patent: 3919438 (1975-11-01), Urkevich
patent: 4018937 (1977-04-01), Levine et al.
patent: 4030416 (1977-06-01), Schank
patent: 4041190 (1977-08-01), Dubois et al.
patent: 4070526 (1978-01-01), Colquhoun
patent: 4107390 (1978-08-01), Gordon
Dubois Gazard, Electron and Ion Beam Science and Technology, 5th International Conference, 1972, pp. 112-122.
Chem. Absts., vol. 83, 1975, 35631x.

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