Showerhead for uniform distribution of process gas

Details Showerhead for uniform distribution of process gas Showerhead for uniform distribution of process gas

1996-03-29

1997-03-25

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723ER, 427575, C23C 1600

Patent

active

056140266

ABSTRACT:
A showerhead includes a plurality of gas inlets for supplying process gas to a semiconductor substrate surface, and a plurality of gas outlets for removing gas and volatile byproducts produced as a result of reaction of the process gas with the substrate surface. Each gas inlet is concentrically positioned within a respective gas outlet. The showerhead improves the utilization of process gas species at the substrate surface by providing gas flow in a direction perpendicular to the substrate surface and avoiding flow of the process gas or volatile byproducts laterally across the substrate surface. The showerhead is useful for uniform stripping of a mask of organic material by direct contact of the incoming reactive gas with the substrate surface and immediate removal of the process gas and volatile byproducts through the concentrically arranged gas outlets.

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