Showerhead electrode for plasma processing

Details Showerhead electrode for plasma processing Showerhead electrode for plasma processing

1998-08-21

2000-04-18

Beck, Shrive

Coating apparatus

Gas or vapor deposition

With treating means

156345, C23C 1600, H05H 100

Patent

active

060502169

ABSTRACT:
A plasma reactor showerhead electrode assembly for processing semiconductor wafers comprised of a typically silicon disk shaped gas plate having a plurality of gas passage holes therethrough, and a graphite circular split collar assembly including first and second semicircular sections forming a circumferential inner slot when opposing ends of said sections are secured together, the slot mating in a dovetail connection with an outer circumferential groove of said gas plate for retaining the latter between said sections. A conductive gasket may be interposed between the gas plate groove and the mating collar assembly to provide an electrically and thermally conductive seal. The first and second semicircular sections have opposing ends screwed or pinned together for providing easy disassembly thereof for replacement of the gas plate.

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patent: 5882411 (1999-03-01), Zhao et al.

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