Coating apparatus – Gas or vapor deposition
Patent
1998-10-06
2000-03-14
Bueker, Richard
Coating apparatus
Gas or vapor deposition
C23C 1600
Patent
active
060367822
ABSTRACT:
A showerhead for use in a process chamber for performing a predetermined process on an object, designed to apply a prescribed gas in the process chamber. The showerhead comprises a main body, a cover, and a support. The main body has a an internal space into which the gas to be supplied into the process chamber is introduced and an opening which opens to the process chamber. The cover closes the opening of the main body and has a plurality of gas-applying holes for applying the gas from the main body. The support supports the cover to the main body and provides a predetermined clearance between the cover and the main body.
REFERENCES:
patent: 5766364 (1998-06-01), Ishida
patent: 5785796 (1998-07-01), Lee
Nakatsuka Sakae
Tachibana Mitsuhiro
Tanaka Sumi
Bueker Richard
Tokyo Electron Limited
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