Etching a substrate: processes – Forming or treating optical article
Patent
1998-08-06
2000-10-31
Gulakowski, Randy
Etching a substrate: processes
Forming or treating optical article
216 25, 313309, B29D 1100, H01L 2100
Patent
active
061397601
ABSTRACT:
Provided with a method of fabricating a 200-250 nm short-wavelength optoelectronic device, which has a combination of an optical device with a plurality of acceleration electrodes and a field emission device with a plurality of acceleration electrodes, from a semiconductor having a 5-6 eV energe band gap, based on a principle that an electron-hole pair is produced using a highly energetic electron which is injected from a field emission device, and short-wavelength photons are emitted when the electron recombines with the hole and confined in a quantum well to emit a light corresponding to the energy level of the quantum well, thereby eliminating the need of using dopants for forming n-p junctions in the semiconductor and achieving high efficiency in terms of energy because highly energetic electrons result in one or more electron-hole pairs.
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John A. Edmond et al., "Blue LEDs, UV photodiodes and high-temperature rectifiers in 6H-SiC", 1993-Elsevier Sciences Publishers B.V., pp. 453-460.
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Baek Mun Cheol
Cho Kyoung Ik
Choi Sung Woo
Lee Hae Gwon
Shim Kyu Hwan
Ahmed Shamim
Electronics and Telecommunications Research Institute
Gulakowski Randy
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