Short-channel Schottky-barrier MOSFET device and...

Details Short-channel Schottky-barrier MOSFET device and... Short-channel Schottky-barrier MOSFET device and...

2007-05-22

2007-05-22

Whitehead, Jr., Carl (Department: 2813)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

Reexamination Certificate

active

11478478

ABSTRACT:
A MOSFET device and method of fabricating is provided. The MOSFET device and method of fabricating utilizes Schottky barrier contacts for source and/or drain contact fabrication within the context of a MOSFET device structure to eliminate the requirement for halo/pocket implants and shallow source/drain extensions to control short channel effects. Additionally, the MOSFET device and method unconditionally eliminates the parasitic bipolar gain associated with MOSFET fabrication, reduces manufacturing costs, tightens control of device performance parameters, and provides for superior device characteristics.

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