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Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Details

430157, 430176, 430302, 430330, 522 30, 522127, G03F 7021, G03C 177

Patent

active

053957342

ABSTRACT:
Acid-sensitive polymers and imageable articles employing them are disclosed. In particular, photosensitive compositions are disclosed comprising: (a) a photoinitiator which generates an acid upon exposure to radiation; and (b) a polymer having acid labile groups pendant from the polymer backbone, said acid labile pendant groups comprising at least one each of A and B wherein A has the formula --T--(C.dbd.O)OCR.sup.1 R.sup.2 OR.sup.3, and B has the formula --T--(C.dbd.O)OR.sup.4 Si(R.sup.5).sub.3, wherein R.sup.1 and R.sup.2 each represent H or an alkyl group with the proviso that at least one of R.sup.1 and R.sup.2 must be hydrogen; R.sup.3 represents an alkyl group; or any two of R.sup.1, R.sup.2, and R.sup.3 may together form a ring group having from 3 to 36 carbon atoms; R.sup.5 represents an alkyl group, aryl group, an alkoxy group, an aryloxy group, an acyloxy group, or a trialkylsiloxy group; and R.sup.4 and T represents a divalent linking group wherein T is bonded to the polymer backbone and R.sup.4 is not bonded to the polymer backbone, the divalent linking group containing a total of from 0 (a covalent bond) or 1 to 18 carbon atoms where up to one of each three carbon atoms may be replaced by oxygen, nitrogen, or sulfur atoms or combinations thereof in the polymer backbone.

REFERENCES:
patent: 4328346 (1982-05-01), Chung et al.
patent: 5024916 (1991-06-01), Steinmann
patent: 5077174 (1991-12-01), Bauer et al.
patent: 5102771 (1992-04-01), Vogel et al.
patent: 5210003 (1993-05-01), Schadeli

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