Shielded substrate support for processing chamber

Details Shielded substrate support for processing chamber Shielded substrate support for processing chamber

1996-02-09

1996-12-31

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118500, C23C 1600

Patent

active

055890032

ABSTRACT:
A shielded substrate support (2) for deposition chambers (6) includes a heated base (8) having a substrate support surface (16) and a sidewall (18). A corrosion-resistant base shield (10) has cover plate (14, 22) and skirt (24) portions and is used to cover and protect the support surface and a part of the sidewall during cleaning operations. The base and the base shield have first and second CTEs, the second CTE being smaller than the first CTE. The base and base shield include complementary locking surfaces sized and positioned so that only when at a higher temperature will the locking surfaces be opposite one another to prevent removal of the base shield from the base. This eliminates the need for mechanical locking elements, such as threads, pins or twist locks, which increase the cost and can be a source of particle contamination.

REFERENCES:
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patent: 4167351 (1979-09-01), Bindin
patent: 4668373 (1987-05-01), Rille et al.
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patent: 5161908 (1992-11-01), Yoshida et al.
patent: 5178681 (1993-01-01), Moore et al.
patent: 5238499 (1993-08-01), van de Ven
patent: 5257872 (1993-11-01), Morgen et al.
patent: 5269894 (1993-12-01), Kerschbaumer
patent: 5494523 (1996-02-01), Steger

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