Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-09-09
1989-12-05
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 204298, C23C 1434, C23C 1446
Patent
active
048850683
ABSTRACT:
A high-efficient sheet plasma sputtering method and an apparatus for carrying out the method which comprise means for deforming an arc plasma stream into a form of sheet by a magnetic field so that ions in the sheet plasma are accelerated to a target which is controlled to have a negative potential to the sheet plasma, whereby a coating layer is formed by sputtering on a substrate arranged opposite the target with respect to the sheet plasma.
REFERENCES:
patent: 3472751 (1969-10-01), King
patent: 3839182 (1974-10-01), Sager
patent: 4424103 (1984-01-01), Cole
patent: 4767931 (1988-08-01), Sato et al.
Kojima Hiroyasu
Oyama Takuji
Suzuki Koichi
Uramoto Joshin
Asahi Glass Company Ltd.
Joshin Uramoto
Nguyen Nam X.
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