Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2004-03-04
2008-07-01
Huff, Mark F. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07393613
ABSTRACT:
A set of at least two masks, coordinated with one another, for the projection of structure patterns, into the same photosensitive layer arranged on a semiconductor wafer. The first mask includes a semitransparent or nontransparent first layer, which is arranged on a first substrate and in which at least one first opening is formed at a first position, the first opening having a first lateral dimension, which is greater than the resolution limit of a projection system for the projection of the structure patterns. The second mask includes a semitransparent or nontransparent second layer, which is arranged on a second substrate and in which at least one dummy structure assigned to the first opening is formed at a second position, the dummy structure having a second lateral dimension, which is smaller than the resolution limit of the projection system wherein the first position on the first mask corresponds to the second position on the second mask.
REFERENCES:
patent: 6558853 (2003-05-01), Kawamura
patent: 6680151 (2004-01-01), Heissmeier et al.
patent: 6730463 (2004-05-01), Heissmeier et al.
patent: 6794095 (2004-09-01), Knobloch
patent: 6807662 (2004-10-01), Toublan et al.
patent: 2004/0053141 (2004-03-01), Pierrat
patent: 2004/0197677 (2004-10-01), Kohle et al.
patent: 100 06 952 (2002-05-01), None
Dettmann Wolfgang
Hennig Mario
Pforr Rainer
Thiele Jörg
Zeiler Karsten
Edell Shapiro & Finnan LLC
Huff Mark F.
Infineon - Technologies AG
Ruggles John
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