Serial irradiation of a substrate by multiple radiation sources

Details Serial irradiation of a substrate by multiple radiation sources Serial irradiation of a substrate by multiple radiation sources

2006-06-29

2009-12-22

Lindsay, Jr., Walter L (Department: 2812)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C438S799000, C257SE21134

Reexamination Certificate

active

07635656

ABSTRACT:
A method for configuring J electromagnetic radiation sources (J≧2) to serially irradiate a substrate. Each source has a different function of wavelength and angular distribution of emitted radiation. The substrate includes a base layer and I stacks (I≧2; J≦I) thereon. Pjdenotes a same source-specific normally incident energy flux on each stack from source j. in each of I independent exposure steps, the I stacks are concurrently exposed to radiation from the J sources, Viand Sirespectively denote an actual and target energy flux transmitted into the substrate via stack i in exposure step i (i=1, . . . , I). t(i) and Pt(i)are computed such that: Viis maximal through deployment of source t(i) as compared with deployment of any other source for i=1, . . . , I; and an error E being a function of |V1−S1|, |V2−S2|, . . . , |Vi−Si| is about minimized with respect to Pi(i=1, . . . , I).

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