Abrading – Precision device or process - or with condition responsive... – By optical sensor
Patent
1997-02-06
1998-06-09
Eley, Timothy V.
Abrading
Precision device or process - or with condition responsive...
By optical sensor
451276, 451303, B24B 4900, B24B 5100
Patent
active
057625360
ABSTRACT:
A technique for utilizing sensors to monitor the polishing of a semiconductor wafer when a linear polisher is utilized to polish the wafer. The sensors are distributed along the surface or are coupled to openings along the surface to monitor the on-going polishing process. The sensed information from the sensors are processed in order to provide feedback for compensating the fluid dispensing when fluid platens are used and/or the downforce exerted by the wafer carrier.
REFERENCES:
patent: 1493779 (1924-05-01), Humphreys
patent: 3363366 (1968-01-01), Estabrook
patent: 3727350 (1973-04-01), Schaller
patent: 3801239 (1974-04-01), Kiser
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 5036015 (1991-07-01), Sandhu et al.
patent: 5081421 (1992-01-01), Miller et al.
patent: 5081796 (1992-01-01), Schultz
patent: 5213655 (1993-05-01), Leach et al.
patent: 5240552 (1993-08-01), Yu et al.
patent: 5308438 (1994-05-01), Cote et al.
patent: 5321304 (1994-06-01), Rostoker
patent: 5431592 (1995-07-01), Nakata
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5558568 (1996-09-01), Talieh et al.
patent: 5569063 (1996-10-01), Morioka et al.
patent: 5593344 (1997-01-01), Weldon et al.
Breivogel Joseph R.
Engdahl Erik H.
Jairath Rahul
Pant Anil K.
Young Douglas W.
Banks Derris H.
Eley Timothy V.
Lam Research Corporation
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