Sensor array for measuring plasma characteristics in plasma...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C156S345280, C118S712000, C438S710000, C438S005000

Reexamination Certificate

active

06902646

ABSTRACT:
A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.

REFERENCES:
patent: 4006404 (1977-02-01), Szuszczewicz et al.
patent: 5167748 (1992-12-01), Hall
patent: 5339039 (1994-08-01), Carlile et al.
patent: 5451784 (1995-09-01), Loewenhardt et al.
patent: 5467013 (1995-11-01), Williams et al.
patent: 5471115 (1995-11-01), Hikosaka
patent: 5667701 (1997-09-01), Sato et al.
patent: 5885402 (1999-03-01), Esquibel
patent: 5936413 (1999-08-01), Booth et al.
patent: 5989349 (1999-11-01), Ke et al.
patent: 6050218 (2000-04-01), Chen et al.
patent: 6113733 (2000-09-01), Eriguchi et al.
patent: 6339297 (2002-01-01), Sugai et al.
patent: 6458239 (2002-10-01), Bhardwaj et al.
patent: 6576922 (2003-06-01), Ma et al.
patent: 6602384 (2003-08-01), Bhardwaj et al.
patent: 6614051 (2003-09-01), Ma
patent: 6706541 (2004-03-01), Toprac et al.
patent: 2002/0173059 (2002-11-01), Ma
patent: 2003/0052259 (2003-03-01), Bayer et al.
patent: 2003/0193010 (2003-10-01), Tsay et al.
patent: 2004/0016402 (2004-01-01), Walther et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sensor array for measuring plasma characteristics in plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sensor array for measuring plasma characteristics in plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sensor array for measuring plasma characteristics in plasma... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3518113

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.