Sensitizing bath for silver containing resist

Details Sensitizing bath for silver containing resist Sensitizing bath for silver containing resist

1981-05-14

1982-08-10

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

1566591, 156662, 427 85, 430270, 430275, 430311, 430313, 430317, 430318, 430321, 430325, 430564, G03C 500

Patent

active

043438873

ABSTRACT:
Fabrication of a resist, useful for high resolution pattern delineation and having a silver containing layer on a glassy material, produces better results when the sensitizing bath contains both potassium silver cyanide and a metal cyanide complex capable of providing CN.sup.- ions to shift the equilibrium of Ag(CN).sub.2.sup.- .revreaction.AgCN+CN.sup.- to the left.

REFERENCES:
patent: 4127414 (1978-11-01), Yoshikawa et al.
patent: 4214249 (1980-07-01), Kasai et al.
patent: 4269935 (1981-05-01), Masters et al.
patent: 4276368 (1981-06-01), Heller et al.
Applied Physics Letters, "A New Inorganic Electron Resist of High Contrast", A. Yoshikawa, O. Ochi, H. Nagai and Y. Mizushima, vol. 31, Aug. 1, 1977, pp. 161-163.
Journal of Vacuum Science and Technology, "Bilevel High Resolution Photolithographic Technique for Use with Wafers with Stepped and/or Reflecting Surfaces", K. L. Tai, W. R. Sinclair, R. G. Vadimsky and J. M. Moran, vol. 16, Nov./Dec. 1979, pp. 1977-1979.

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