Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-08-14
1999-06-22
Nuzzolillo, Maria
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302731, 4302811, 4302881, 430919, 430920, 430926, G03C 173
Patent
active
059142154
ABSTRACT:
Improved photopolymerization initiator systems are comprised of a spectral sensitizer that sensitizes in the ultraviolet or visible regions of the spectrum and an N-aryl, O-aryl or S-aryl polycarboxylic acid co-initiator. The improved initiator systems are incorporated in photo-polymerizable compositions containing one or more addition-polymerizable ethylenically-unsaturated compounds to form compositions suitable for the preparation of radiation-sensitive layers in lithographic printing plates adapted to be imagewise-exposed with ultraviolet- or visible-light-emitting lasers such as argon-ion lasers and frequency doubled Nd:YAG lasers. Such plates are able to effectively meet the dual requirements of very high photospeed and very good shelf-life required in computer-to-plate systems.
REFERENCES:
patent: 3579339 (1971-05-01), Chang et al.
patent: 4095019 (1978-06-01), Markiewitz et al.
patent: 4278751 (1981-07-01), Specht et al.
patent: 4766055 (1988-08-01), Kawabata et al.
patent: 4868092 (1989-09-01), Kawabata et al.
patent: 4921827 (1990-05-01), Ali et al.
patent: 4939069 (1990-07-01), Kawabata et al.
patent: 4965171 (1990-10-01), Kawabata et al.
patent: 4971892 (1990-11-01), Ali et al.
patent: 5153236 (1992-10-01), Kaji et al.
patent: 5378579 (1995-01-01), Arimatsu et al.
patent: 5445918 (1995-08-01), Doba et al.
D.P. Specht, et al. Tetrahedron, 38, 1203-1211 (1982).
D.F. Eaton, Photo. Sci. and Eng., 23(3), 150-154 (1979).
D.F. Eaton, Adv. in Photochem., 13, 427-487 (1986).
M. Kawabata et al., J. Photopolym. Sci. Technol., 1 (2), 222-227 (1988).
B.M. Monroe and G.C. Weed, Chem. Rev., 93, 435-448 (1993).
Fouassier et al, Journal of Imaging Science and Technology, vol. 37, No. 2, Mar./Apr., 1993, p. 2.
Marino et al, Proceedings of the Radtech '94 Conference, vol. 1, p. 1691 (1994).
Yamaoka et al, Journal of Applied Polymer Science, vol. 38, 1271-1285 (1989).
Gurney Jeffery Allen
West Paul Richard
Kodak Polychrome Graphic, LLC
Nuzzolillo Maria
Weiner Laura
LandOfFree
Sensitized photopolymerizable compositions and use thereof in li does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sensitized photopolymerizable compositions and use thereof in li, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sensitized photopolymerizable compositions and use thereof in li will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1707571