Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-11-19
1999-08-24
Nuzzolillo, Maria
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302881, 430919, 430920, 430926, 522 25, 522 26, 522 28, 522 30, 522173, 522182, G03C 173
Patent
active
059423722
ABSTRACT:
Improved photopolymerization initiator systems are comprised of a spectral sensitizer that sensitizes in the ultraviolet or visible regions of the spectrum and an N-aryl, O-aryl or S-aryl polycarboxylic acid co-initiator. The improved initiator systems are incorporated in photo-polymerizable compositions containing one or more addition-polymerizable ethylenically-unsaturated compounds to form compositions suitable for the preparation of radiation-sensitive layers in lithographic printing plates adapted to be imagewise-exposed with ultraviolet- or visible-light-emitting lasers such as argon-ion lasers and frequency doubled Nd:YAG lasers. Such plates are able to effectively meet the dual requirements of very high photospeed and very good shelf-life required in computer-to-plate systems.
REFERENCES:
patent: 3579339 (1971-05-01), Chang et al.
patent: 4095019 (1978-06-01), Markiewitz et al.
patent: 4278751 (1981-07-01), Specht et al.
patent: 4766055 (1988-08-01), Kawabata et al.
patent: 4868092 (1989-09-01), Kawabata et al.
patent: 4921827 (1990-05-01), Ali et al.
patent: 4939069 (1990-07-01), Kawabata et al.
patent: 4965171 (1990-10-01), Kawabata et al.
patent: 4971892 (1990-11-01), Ali et al.
patent: 5153236 (1992-10-01), Kaji et al.
patent: 5378579 (1995-01-01), Arimatsu et al.
patent: 5445918 (1995-08-01), Doba et al.
Fouassier et al, Journal of Imaging Science and Technology, vol. 37, No. 2, Mar./Apr., 1993, p. 2.
Marino et al, Proceedings of the Radtech '94 Conference, vol. 1, p. 1691 (1994).
Yamaoka et al, Journal of Applied Polymer Science, vol. 38, 1271-1285 (1989).
B. M. Monroe and G.C. Weed, Chem. Rev., 93, 435-448 (1993).
M. Kawabata et al., J. Photopoly. Sci. Technol., 1 (2), 222-227 (1988).
D. P. Specht et al., Tetrahedron, 38, 1203-1211 (1982).
D.F. Eaton, Photo Sci and Eng., 23 (5), 150-154 (1979).
D.F. Eaton, Adv. in Photochem, 13, 427-487 (1986).
Gurney Jeffery Allen
West Paul Richard
Kodak Polychrome Graphics LLC
Nuzzolillo Maria
Weiner Laura
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