Semiconductor wafer washing system and method of supplying...

Details Semiconductor wafer washing system and method of supplying... Semiconductor wafer washing system and method of supplying...

2005-03-08

2005-03-08

Markoff, Alexander (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S104100, C134S155000, C134S186000, C134S902000

Reexamination Certificate

active

06863079

ABSTRACT:
A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.

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patent: 6192902 (2001-02-01), Makita et al.
patent: 6463941 (2002-10-01), Takita

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