Semiconductor wafer cleaning method and apparatus

Details Semiconductor wafer cleaning method and apparatus Semiconductor wafer cleaning method and apparatus

1989-06-16

1991-03-19

Chaudhuri, Olik

Cleaning and liquid contact with solids

Processes

With treating fluid motion

134 2, 134 3, 134 254, 134102, B08B 302, B08B 308, B08B 500

Patent

active

050007955

ABSTRACT:
A reagent chemical is directed along a first pipe portion (20) that extends along one side of the array of wafers (14) and which contains a plurality of jets (33) for projecting the chemical toward the wafers. A plurality of second pipe portions (21) transmits an inert gas, with each pipe portion having a plurality of jets (34) for projecting the gas toward the floor of the tank.

REFERENCES:
patent: 4209342 (1980-06-01), Workman
patent: 4458703 (1984-07-01), Inoue
patent: 4577650 (1986-03-01), McConnell
patent: 4778532 (1988-10-01), McConnell et al.

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