Semiconductor wafer cleaning apparatus

Details Semiconductor wafer cleaning apparatus Semiconductor wafer cleaning apparatus

1996-12-26

1998-03-24

Chin, Randall

Brushing, scrubbing, and general cleaning

Machines

Brushing

15 77, A46B 1106

Patent

active

057298564

ABSTRACT:
A semiconductor wafer cleaning apparatus having an edge rinse member adapted for rinsing edges of a semiconductor wafer and having a moving member adapted to permit horizontally movement of the edge rinse member, wherein the apparatus is adapted to minimize or prevent an upper surface of the wafer from being stained with pollutants during rinsing. The wafer cleaning apparatus minimizes or prevents rebounding of a rinse solution containing particles from the inside wall of a bowl during rinsing of the edges of a semiconductor wafer.

REFERENCES:
patent: 1366306 (1921-01-01), Wick
patent: 2129019 (1938-09-01), Mulvihill
patent: 5421056 (1995-06-01), Tateyama

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