Semiconductor wafer analysis system and method

Details Semiconductor wafer analysis system and method Semiconductor wafer analysis system and method

1998-11-18

2000-12-05

Metjahic, Safet

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

438928, 324537, H01L 2100, H01H 3102

Patent

active

061565806

ABSTRACT:
A semiconductor wafer analysis system and method. In various embodiments, methods and systems are described for inspection and review of semiconductor wafers. Wafer inverters are provided, and inspection data is gathered for both the front and back sides of the wafers. The wafer inverters are also available at wafer review stations so that both the front and back sides of the wafers can be reviewed with a microscope.

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