Material or article handling – Apparatus for moving intersupporting articles into – within,... – Stack forming apparatus
Patent
1994-06-17
1996-10-15
Underwood, Donald W.
Material or article handling
Apparatus for moving intersupporting articles into, within,...
Stack forming apparatus
414222, 414749, 414935, B65G 3500
Patent
active
055648894
ABSTRACT:
A resist coating system for semiconductor wafers has a treatment unit and a transfer unit. The treatment unit has a plurality of treatment sections, and a transfer robot moves along the treatment sections. The transfer robot has a vertically movable driving block and first, and second and third arms for holding the semiconductor wafers, which are vertically arranged on the driving block and supported by the same such that they can advance and retreat independent of one another, and an adiabatic plate supported by the driving block between the third arm and the first and second arms. The third arm is used to take each wafer out of a cooling section, which is one of the treatment section. The wafer exchange in each treatment section is performed by means of two of the first through third arms. An arm for taking from the treatment section a wafer having been treated is operated in synchronism with another arm for inserting into the section a wafer to be treated.
REFERENCES:
patent: 4775281 (1988-10-01), Prentakis
patent: 5004399 (1991-04-01), Sullivan et al.
patent: 5151008 (1992-09-01), Ishida et al.
patent: 5297910 (1994-03-01), Yoshioka et al.
patent: 5364222 (1994-11-01), Akimoto et al.
Tokyo Electron Kyushu Limited
Tokyo Electron Limited
Underwood Donald W.
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