Semiconductor transistor device and method of manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure – With base region having specified doping concentration...

Reexamination Certificate

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C257S350000, C257S378000, C257S401000, C257S057000, C257S347000, C257S370000, C257SE29202

Reexamination Certificate

active

08058703

ABSTRACT:
A semiconductor transistor device includes a drift region, an insulating structure, a gate insulator, a gate electrode, a source, and a drain. The drift region includes a first lateral portion having a first dopant concentration and a second lateral portion having a second dopant concentration that is higher than the first lateral portion. The insulating structure is formed on the drift region and is disposed over a border between the first and second lateral portions such that hole generation is minimized in the drift region during operation.

REFERENCES:
patent: 5132753 (1992-07-01), Chang et al.
patent: 6117738 (2000-09-01), Tung
patent: 6191453 (2001-02-01), Petruzzello et al.
patent: 6258674 (2001-07-01), Kwon et al.
patent: 2002/0125542 (2002-09-01), Suzuki et al.

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