Semiconductor substrate surface protection method

Details Semiconductor substrate surface protection method Semiconductor substrate surface protection method

2007-03-13

2007-03-13

Luu, Chuong Anh (Department: 2818)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S623000, C438S622000

Reexamination Certificate

active

10660490

ABSTRACT:
A convenient method of depositing chemical protection material on the surface of a semiconductor substrate whereby deposition of contaminating substances after a clean surface has been obtained can be prevented and maintaining of this surface performed includes a process of depositing a high molecular straight-chain organic compound3onto a highly clean surface2of a semiconductor substrate1during semiconductor washing or after semiconductor washing of the semiconductor substrate.

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“Chemical Contamination in the semiconductor process environment and counter-measures therefor”. Realize Inc., pp. 268-269 (p. 6 of the specification).
“The current status of contamination in the ULSI fabricating”. Realize Inc., pp. 378-383.

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