Semiconductor substrate, substrate for semiconductor crystal...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S405000, C438S050000

Reexamination Certificate

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07442999

ABSTRACT:
A semiconductor substrate includes: a semiconductor crystal layer grown on one face of a substrate; and a stress relaxation layer, which is formed on the other face opposite to the one face and the side face of the substrate and applies stress to the substrate in the same direction as the direction of stress which the semiconductor crystal layer applies to the substrate. In this case, stress of the semiconductor crystal layer to the substrate is offset. Therefore, warp of the semiconductor substrate and generation of cracks are inhibited.

REFERENCES:
patent: 6031252 (2000-02-01), Miura et al.
patent: 6045626 (2000-04-01), Yano et al.
patent: 6294440 (2001-09-01), Tsuda et al.
patent: 6770504 (2004-08-01), Horning et al.
patent: 2006/0024512 (2006-02-01), Kishimoto et al.
patent: 2003-113000 (2003-04-01), None

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