Semiconductor substrate including a single or multi-layer film h

Details Semiconductor substrate including a single or multi-layer film h Semiconductor substrate including a single or multi-layer film h

1992-03-16

1994-08-02

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, 427249, G21K 500

Patent

active

053352564

ABSTRACT:
An X-ray mask support has an X-ray permeable film and a support frame supporting the film and the X-ray permeable film mainly includes a single-layer film having different densities in its thickness direction or a multi-layer laminate film of layers having different densities, but being constituted of compounds having the same main component. The X-ray mask support can be used as an X-ray mask structure for X-ray lithography by providing an X-ray absorber on the X-ray permeable film. The X-ray permeable film exhibits a high permeability for X-rays and visible
ear infrared rays and does not bend even by X-ray irradiation, thereby achieving X-ray exposure of high precision and high resolution.

REFERENCES:
patent: 4701391 (1987-10-01), Lentfer et al.
patent: 4724169 (1988-02-01), Keem et al.
patent: 4941942 (1990-07-01), Bruns
patent: 5012500 (1991-04-01), Watanabe et al.
patent: 5052033 (1991-09-01), Ikeda et al.
patent: 5082695 (1992-01-01), Yamada et al.
patent: 5196283 (1993-03-01), Ikeda et al.

Affiliated with

Also associated with

Rating

Semiconductor substrate including a single or multi-layer film h does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor substrate including a single or multi-layer film h, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor substrate including a single or multi-layer film h will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-70216