Semiconductor substrate having first and second pairs of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S296000, C257S068000, C257S071000, C257S309000, C257S905000, C257S070000, C257S300000, C257S305000, C257S907000, C257S906000

Reexamination Certificate

active

11292028

ABSTRACT:
The invention includes methods of forming memory circuitry. In one implementation, a semiconductor substrate includes a pair of word lines having a bit node received therebetween. A bit node contact opening is formed within insulative material over the bit node. Sacrificial plugging material is formed within the bit node contact opening between the pair of word lines. Sacrificial plugging material is removed from the bit node contact opening between the pair of word lines, and it is replaced with conductive material that is in electrical connection with the bit node. Thereafter, the conductive material is formed into a bit line.

REFERENCES:
patent: 5250457 (1993-10-01), Dennison
patent: 5387533 (1995-02-01), Kim
patent: 5563089 (1996-10-01), Jost et al.
patent: 5686747 (1997-11-01), Jost et al.
patent: 5728617 (1998-03-01), Tseng
patent: 5821140 (1998-10-01), Jost et al.
patent: 5834349 (1998-11-01), Tseng
patent: 5918122 (1999-06-01), Parekh et al.
patent: 5981333 (1999-11-01), Parekh et al.
patent: 6010935 (2000-01-01), Doan
patent: 6015983 (2000-01-01), Parekh
patent: 6037218 (2000-03-01), Dennison
patent: 6060351 (2000-05-01), Parekh et al.
patent: 6107189 (2000-08-01), Wald et al.
patent: 6140172 (2000-10-01), Parekh
patent: 6177695 (2001-01-01), Jeng
patent: 6180450 (2001-01-01), Dennison et al.
patent: 6214727 (2001-04-01), Parekh
patent: 6228710 (2001-05-01), Parekh et al.
patent: 6228738 (2001-05-01), Parekh et al.
patent: 6232176 (2001-05-01), Parekh et al.
patent: 6238971 (2001-05-01), Parekh et al.
patent: 6245631 (2001-06-01), Agarwal et al.
patent: 6284641 (2001-09-01), Parekh
patent: 6297525 (2001-10-01), Parekh et al.
patent: 6300215 (2001-10-01), Shin
patent: 6312988 (2001-11-01), Lowrey et al.
patent: 6323080 (2001-11-01), Parekh
patent: 6329682 (2001-12-01), Parekh et al.
patent: 6329684 (2001-12-01), Parekh et al.
patent: 6334692 (2002-01-01), Hsueh
patent: 6337274 (2002-01-01), Hu et al.
patent: 6344692 (2002-02-01), Ikemasu et al.
patent: 6359302 (2002-03-01), Parekh et al.
patent: 6368962 (2002-04-01), Hu et al.
patent: 6376301 (2002-04-01), Parekh et al.
patent: 6376380 (2002-04-01), Tang et al.
patent: 6383868 (2002-05-01), Parekh et al.
patent: 6407455 (2002-06-01), Wald et al.
patent: 6429476 (2002-08-01), Suzuki et al.
patent: 6458649 (2002-10-01), Zahurak et al.
patent: 6468859 (2002-10-01), Parekh et al.
patent: 6486060 (2002-11-01), Hermes et al.
patent: 6500709 (2002-12-01), Parekh et al.
patent: 6524907 (2003-02-01), Parekh et al.
patent: 6589876 (2003-07-01), Tran
patent: 6617635 (2003-09-01), Parekh et al.
patent: 6734479 (2004-05-01), Ogishima et al.
patent: 2004/0110341 (2004-06-01), Park

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor substrate having first and second pairs of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor substrate having first and second pairs of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor substrate having first and second pairs of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3728343

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.