Semiconductor substrate containing anti-reflective layer

Details Semiconductor substrate containing anti-reflective layer Semiconductor substrate containing anti-reflective layer

1997-04-14

1998-06-02

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

4302711, 430510, 430514, 430531, G03C 1825, G03C 1835

Patent

active

057597553

ABSTRACT:
A method for manufacturing an anti-reflective layer comprises the steps of coating a polymer solution containing at least one compound selected from the group consisting of phenol-based resins, water-soluble resins and acryl resins as a main component, and then baking at a high temperature. The method is simplified and the layer's reflectance is greatly enhanced.

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patent: 5276126 (1994-01-01), Rogler
patent: 5278010 (1994-01-01), Day et al.

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