Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Physical deformation
Reexamination Certificate
2007-03-09
2010-06-01
Wilson, Allan R. (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Responsive to non-electrical signal
Physical deformation
C257SE29325
Reexamination Certificate
active
07728396
ABSTRACT:
A method and a structure are provided for preventing lift-off of a semiconductor monitor pattern from a substrate. A semiconductor structure and a semiconductor monitor structure are formed on a substrate. A material layer is formed covering the semiconductor monitor structure. A part of the semiconductor structure is removed without removing the semiconductor monitor structure, by using the material layer as an etch protection layer. A mask for the method is also provided. The mask includes a clear area and a dark area. The dark area prevents a semiconductor monitor structure from being subjected to exposure so as to form a material layer covering the semiconductor monitor structure and prevent removal of the semiconductor monitor structure from the substrate while a part of a semiconductor structure is removed.
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Taiwan Patent Application No. 094143570 Filed Dec. 9, 2005. TW Search Report dated Aug. 17, 2007.
Taiwan Patent Application No. 094143570 Filed Dec. 9, 2005. TW Written Opinion dated May 22, 2007.
Chang Ming-Chih
Lai Tsung-Mu
Laing Che-Rong
Wu Hua-Shu
Duane Morris LLP
Taiwan Semiconductor Manufacturing Co. Ltd.
Wilson Allan R.
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