Semiconductor structure containing multiple optimized well regio

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257378, 257509, H01L 2976, H01L 2994, H01L 2900

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active

056524560

ABSTRACT:
A BiCMOS process is provided for fabricating on the same semiconductor substrate three types of N-wells optimized respectively for (i) PMOS FETs requiring low P+/N-well capacitance; (ii) NPN bipolar transistors which do not require low collector-to-substrate capacitance and PMOS FETs which require latch-up immunity; and (iii) NPN bipolar transistors which require low collector-to-substrate capacitance.

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Hayden, J.D., et al., "A High-Performance Quadruple Well, Quadruple Poly BICMOS Process for Fast 16 Mb SRAMS", 1992 IEEE, Dec . 13-16, 1992, IEDM 92-819, pp. 32.6.1-32.6.4.
Wolf, Stanley, "Silicon Processing for the VLSI Era", vol. 2: Process Integration, Long Beach, California, published Lattice Press, 1990.

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