Semiconductor structure and method for making the same

Details Semiconductor structure and method for making the same Semiconductor structure and method for making the same

2011-08-23

2011-08-23

Thomas, Toniae (Department: 2822)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S674000, C438S685000, C257SE21168, C257SE21171

Reexamination Certificate

active

08003528

ABSTRACT:
A method for forming a semiconductor structure is provided. The method includes providing a substrate; forming a dielectric layer on the substrate; forming a conductor pattern on a main surface of the dielectric layer, the conductor pattern having a top surface and sidewalls; and performing a selective atomic layer deposition (ALD) process to selectively deposit a conformal metal layer onto the top surface and sidewalls of the conductor pattern, but without depositing onto the main surface of the dielectric layer substantially.

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