Semiconductor structure

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S336000, C257S344000, C257S369000, C257S382000, C257S384000, C257SE21634, C257SE27064

Reexamination Certificate

active

07453120

ABSTRACT:
A method for fabricating a semiconductor structure is described. A substrate is provided, having thereon a gate structure and a spacer on the sidewall of the gate structure and having therein an S/D extension region beside the gate structure. An opening is formed in the substrate beside the spacer, and then an S/D region is formed in or on the substrate at the bottom of the opening. A metal silicide layer is formed on the S/D region and the gate structure, and then a stress layer is formed over the substrate.

REFERENCES:
patent: 5710450 (1998-01-01), Chau et al.
patent: 5908313 (1999-06-01), Chau et al.
patent: 6465311 (2002-10-01), Shenoy
patent: 6812086 (2004-11-01), Murthy et al.
patent: 7041543 (2006-05-01), Varadarajan et al.
patent: 7052946 (2006-05-01), Chen et al.
patent: 7078285 (2006-07-01), Suenaga
patent: 7118977 (2006-10-01), Chidambaram et al.
patent: 7118999 (2006-10-01), Yang et al.
patent: 7132338 (2006-11-01), Samoilov et al.
patent: 7148143 (2006-12-01), Bu et al.
patent: 7151034 (2006-12-01), Lee et al.
patent: 7166528 (2007-01-01), Kim et al.
patent: 7172933 (2007-02-01), Huang et al.
patent: 7193254 (2007-03-01), Chan et al.
patent: 7195985 (2007-03-01), Murthy et al.
patent: 7202120 (2007-04-01), Shima et al.
patent: 7220630 (2007-05-01), Cheng et al.
patent: 2004/0262694 (2004-12-01), Chidambaram
patent: 2005/0095795 (2005-05-01), Son et al.
patent: 2006/0057810 (2006-03-01), Smith et al.
patent: 2006/0115949 (2006-06-01), Zhang et al.
patent: 2006/0199285 (2006-09-01), Chidambaram et al.
patent: 2006/0216876 (2006-09-01), Kim et al.
patent: 2006/0226453 (2006-10-01), Wang et al.
patent: 2007/0099388 (2007-05-01), Jain
patent: 2007/0128786 (2007-06-01), Cheng et al.
patent: 2007/0148835 (2007-06-01), Shima et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor structure will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4036459

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.