Semiconductor storage device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S903000

Reexamination Certificate

active

06933578

ABSTRACT:
A configuration is provided to reduce the difference in characteristics caused between transistors even in the case where the shapes of gate electrodes vary. To do this, a dummy gate contact region disposed on an isolation region between an n-channel type transistor and a p-channel type transistor is provided in a gate electrode in a manner of corresponding to a gate contact region of another gate electrode.

REFERENCES:
patent: 6037638 (2000-03-01), Abe et al.
patent: 6664603 (2003-12-01), Karasawa et al.
patent: 2003/0132490 (2003-07-01), Komori
patent: 10-247691 (1998-09-01), None

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