Semiconductor producing apparatus, and wafer vacuum chucking dev

Details Semiconductor producing apparatus, and wafer vacuum chucking dev Semiconductor producing apparatus, and wafer vacuum chucking dev

1996-03-07

1999-11-02

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, 118728, 118730, C23G 1600

Patent

active

059762608

ABSTRACT:
It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves (125) on the surface on which the wafer (1) is sucked and fixed, in which vacuum evacuation paths (105) each for vacuum evacuating each block groove (125) are provided for each block groove (125). When the wafer (1) is sucked and fixed under low pressure, even if the degree of vacuum in one of the block grooves (125) decreases due to attachment of dusts on part of the suction surface, or the like, the wafer (1) can surely be sucked and held.

REFERENCES:
patent: 3717439 (1973-02-01), Sakai
patent: 4131267 (1978-12-01), Ono et al.
patent: 4183545 (1980-01-01), Daly
patent: 4403567 (1983-09-01), DaCosta et al.
patent: 4542298 (1985-09-01), Holden
patent: 4817558 (1989-04-01), Itoh
patent: 4836138 (1989-06-01), Robinson
patent: 4869481 (1989-09-01), Yabu et al.
patent: 5063031 (1991-11-01), Sato
patent: 5180000 (1993-01-01), Wagner et al.
patent: 5191218 (1993-03-01), Mori et al.
patent: 5238499 (1993-08-01), van de Ven
patent: 5275629 (1994-01-01), Ajika
patent: 5324012 (1994-06-01), Aoyama et al.
patent: 5370739 (1994-12-01), Foster
patent: 5399199 (1995-03-01), Kiyama

Affiliated with

Also associated with

Rating

Semiconductor producing apparatus, and wafer vacuum chucking dev does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor producing apparatus, and wafer vacuum chucking dev, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor producing apparatus, and wafer vacuum chucking dev will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2129428