Semiconductor processing chamber having diamond coated component

Coating apparatus – Gas or vapor deposition – Work support

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Details

118728, 118500, C23L 1600

Patent

active

059163704

ABSTRACT:
A semiconductor processing chamber having diamond coated components.

REFERENCES:
patent: 5720818 (1998-02-01), Donde
patent: 5725673 (1998-03-01), Anderson

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