Coating apparatus – Gas or vapor deposition – Work support
Patent
1998-06-12
1999-06-29
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118728, 118500, C23L 1600
Patent
active
059163704
ABSTRACT:
A semiconductor processing chamber having diamond coated components.
REFERENCES:
patent: 5720818 (1998-02-01), Donde
patent: 5725673 (1998-03-01), Anderson
Applied Materials Inc.
Bueker Richard
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