Measuring and testing – Surface and cutting edge testing – Roughness
Reexamination Certificate
2006-09-26
2008-12-16
Cygan, Michael (Department: 2855)
Measuring and testing
Surface and cutting edge testing
Roughness
Reexamination Certificate
active
07464584
ABSTRACT:
A semiconductor probe and a method of writing and reading information using the same. The semiconductor probe includes a cantilever and a tip formed on an end portion of the cantilever to write or read information on or from a ferroelectric medium on a surface of which an electrode is formed. The tip includes a resistive region lightly doped with semiconductor impurities and a conductive region heavily doped with the semiconductor impurities. The cantilever includes an electrostatic force generation electrode formed on a bottom surface facing the medium. A contact force between the tip and the medium is adjusted by selectively applying a voltage between the electrode formed on the ferroelectric medium and the electrostatic force generation electrode.
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KR 10-2003-0087372 KIPO machine translation.
Hong Seung-bum
Jung Ju-hwan
Ko Hyoung-soo
Park Hong-sik
Cygan Michael
Samsung Electronics Co,. Ltd.
Sughrue & Mion, PLLC
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