Semiconductor memory element, semiconductor device and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S317000, C257S319000, C257S320000, C257S321000, C257S324000

Reexamination Certificate

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07045853

ABSTRACT:
In a semiconductor flash memory required to have high reliability, injection and extraction of electrons must be performed through an oxide film obtained by directly oxidizing a silicon substrate. Accordingly, the voltage to be used is a large voltage ranging from positive to negative one. In contrast, by storing charges in a plurality of dispersed regions, high reliability is achieved. Based on the high reliability, transfer of electrons is permitted through not only the oxide film obtained by directly thermally oxidizing a high reliability silicon substrate but also another oxide film deposited by CVD, or the like. In consequence, a device is controlled by electric potentials of the same polarity upon writing of data and upon erasing of data.

REFERENCES:
patent: 5408115 (1995-04-01), Chang
patent: 6342716 (2002-01-01), Morita et al.
patent: 6388293 (2002-05-01), Ogura et al.
patent: 6400610 (2002-06-01), Sadd
patent: 6586785 (2003-07-01), Flagan et al.

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