Static information storage and retrieval – Systems using particular element – Flip-flop
Reexamination Certificate
2003-01-07
2004-09-21
Phung, Anh (Department: 2824)
Static information storage and retrieval
Systems using particular element
Flip-flop
C365S049130
Reexamination Certificate
active
06795333
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a semiconductor memory device, and particularly, to a semiconductor memory device arranged at a crossing portion of a word line and first and second bit lines.
2. Description of the Background Art
FIG. 24
is a circuit diagram showing the configuration of a memory cell
90
in a conventional static random access memory (hereinafter referred to as SRAM). In
FIG. 24
, memory cell
90
includes P-channel MOS transistors
91
,
92
and N-channel MOS transistors
93
to
96
. P-channel MOS transistors
91
,
92
are connected between the lines of a power- supply potential VDD and storage nodes N
91
, N
92
respectively, and have gates connected to storage nodes N
92
, N
91
respectively. N-channel MOS transistors
93
,
94
are connected between storage nodes N
91
, N
92
and the lines of a ground potential GND respectively, and have gates connected to storage nodes N
92
, N
91
respectively. N-channel MOS transistors
95
,
96
are connected between storage nodes N
91
, N
92
and bit lines BL, /BL respectively, and have gates both connected to a word line WL. MOS transistors
91
,
93
form an inverter that applies an inversion signal of a signal at storage node N
92
to storage node N
91
. MOS transistors
92
,
94
form an inverter that applies an inversion signal of a signal at storage node N
91
to storage node N
92
. The two inverters are connected between storage nodes N
91
and N
92
in back-to-back connection, forming a latch circuit.
At writing operation, word line WL is set to a logic high or an “H” level of a selective level to render N-channel MOS transistors
95
,
96
conductive. If one of bit lines BL, /BL (BL for example) is set to the H level while the other bit line (/BL in this example) is set to a logic low or an “L” level in response to a write data signal, MOS transistors
91
,
94
are rendered conductive while MOS transistors
92
,
93
are rendered non-conductive, latching the level of storage nodes N
91
, N
92
. If word line WL is set to the L level of a non-selective level, N-channel MOS transistors
95
,
96
are rendered non-conductive, and a data signal is stored into memory cell
90
.
At reading operation, bit lines BL, /BL are pre-charged to the H level, and thereafter word line WL is set to the H level of the selective level. This allows current to flow out an the lines of ground potential GND from a bit line (/BL in this example) through N-channel MOS transistors
96
and
94
, lowering the potential of bit line /BL. By comparing the potential of bit line BL with the potential of bit line /BL, stored data in memory cell
90
can be read out.
FIG. 25
is a circuit diagram showing the configuration of a memory cell
100
in a conventional content addressable memory (hereinafter referred to as CAM). Referring to
FIG. 25
, memory cell
100
is configured by adding N-channel MOS transistors
101
to
103
to memory cell
90
in FIG.
24
. In CAM, a match line ML is provided per word, and a plurality of memory cells
100
corresponding to one word are connected to one match line ML. N
15
channel MOS transistors
101
,
102
are connected between bit lines BL, /BL and node N
101
respectively, and have gates connected to storage nodes N
91
, N
92
respectively. N-channel MOS transistor
103
is connected between match line ML and the line of ground potential GND, and has the gate; connected to node N
101
arranged between N-channel MOS transistors
101
and
102
.
Data writing/reading are performed using word line WL and bit line pair BL, /BL, as in the SRAM in FIG.
24
. At data retrieval, match line ML is pre-charged to the H level, and thereafter an inversion data signal of a data signal to be retrieved is applied to bit lines BL, /BL. If storage data are “0” and “1,” storage nodes (N
91
, N
92
) have (0, 1) and (1, 0) respectively. *If the data to be retrieved are “0” and “1,” bit lines (BL, /BL) are provided with (1, 0) and (0, 1).
If, for example, the storage data is “0” and the retrieval data is “0,” storage nodes (N
91
, N
92
) have (0, 1), rendering N-channel MOS transistor
101
non-conductive and N-channel MOS transistor
102
conductive. Here, bit lines (BL, /BL) have (1, 0), so that node N
101
is set to the L level. Thus, N-channel MOS transistor
103
is rendered non-conductive, while match line ML remains at the H level. If the stored data is “1” whereas the retrieval data is “0,” storage nodes (N
91
, N
92
) have (1, 0), rendering N-channel MOS transistor
101
conductive and N-channel MOS transistor
102
non-conductive. Here, bit lines (BL, /BL) have (1, 0),
50
that node N
101
is set to the H level. Thus, N-channel MOS transistor
103
is rendered conductive, lowering match line ML to the L level.
That is, if there is even one bit of a plurality of data pieces included in one word that does not match with a retrieval word, match lines ML corresponding to that word are lowered to the L level (“0”). Only match line ML corresponding to a word having all bits matching with the retrieval word is held at the H level (“1”).
Thus, each of the conventional memory cells
90
and
100
had only two types of data holding states. Accordingly, if the data signal had three values of “0,” “1” and “x,” two memory cells, i.e. a memory cell holding “0” or “1” and a memory cell holding “x” which indicates whether data is valid or invalid, had to be used as one set. This increased the area occupied by the memory, resulting in large power consumption.
SUMMARY OF THE INVENTION
A primary object of the present invention is, therefore, to provide a semiconductor memory device having a small occupied area and power consumption.
A semiconductor memory device according to the present invention includes first and second inverters having output nodes connected to first and second storage nodes respectively; a first switching circuit rendering conductive between the first storage node and an input node of the second inverter and applying a second potential to an input node of the first inverter if first and second potentials are applied to the first and second storage nodes respectively, rendering conductive between the second storage node and the input node of the first inverter and applying the second potential to the input node of the second inverter if the second and first potentials are applied to the first and second storage nodes respectively, and applying the second potential to each of the input nodes of the first and second inverters if the first potential is applied to each of the first and second storage nodes; and a second switching circuit rendering conductive between the first bit line and the first storage node and between the second bit line and the second storage node, in response to the word line being set to a selective level. Thus, the semiconductor memory device has three types of storing/holding states, i.e., a state where the first and second potentials are stored into the first and second storage nodes respectively, a state where the, second and first potentials are stored into the first and second storage nodes respectively, and a state where the first potential is stored into each of the first and second storage nodes. Accordingly, compared to the conventional case where two semiconductor memory devices (memory cells) including two inverters were required to hold three kinds of data signals, the number of transistors can be reduced. This allows reduction of the occupied area. Moreover, the number of bit lines can also be reduced, so that reduction in an amount of charging/discharging of bit lines may also be expected, leading to lower power consumption.
The foregoing and other objects, features, aspects and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings.
REFERENCES:
patent: 5841874 (1998-11-01), Kempke et al.
patent: 6262932 (2001-07-01), Nguyen
patent: 6522562 (2003-02-01), Foss
patent: 6674660 (2004-01-01), Sh
Leydig , Voit & Mayer, Ltd.
Phung Anh
Renesas Technology Corp.
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