Semiconductor memory device and method for generating ROM...

Details Semiconductor memory device and method for generating ROM... Semiconductor memory device and method for generating ROM...

2006-07-18

2009-12-15

Siek, Vuthe (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07634744

ABSTRACT:
By simplifying the shape of memory cell diffused mask patterns, the patterns are formed stably and the yield of a semiconductor memory device is improved. Adjacent 2-bit memory cell transistors are formed with one diffused mask pattern, the diffused mask patterns are arranged on a memory cell array, and metal lines are used as source common lines for the memory cells formed at the diffused mask patterns. In this way, that is, by using 2-bit rectangular diffused mask patterns as the memory cell diffused mask patterns and using the metal lines as the source common lines instead of diffused layers, the shape of the memory cell diffused mask patterns is simplified. And furthermore, the continuity of the memory cell diffused mask patterns used as actual memory cells is kept, accuracy in forming the actual memory cell diffused mask patterns is improved, and the yield of the semiconductor memory device is improved.

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