Semiconductor manufacturing scanner having reticle masking...

Details Semiconductor manufacturing scanner having reticle masking... Semiconductor manufacturing scanner having reticle masking...

2006-05-22

2008-11-11

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07450218

ABSTRACT:
A scanner of photolithographic equipment has a reticle masking device capable of forming an aperture, in the shape of a slit, without inducing vibrations in the scanner. The reticle masking device forms the slit electronically, without the use of motive power, and can likewise vary the width of the slit in a direction parallel to the direction of movement of a reticle stage. In particular, the width of the slit is increase at the beginning and decreased at the end of a scan. Preferably, the reticle masking device is a liquid crystal display. It is thus possible to isolate and compensate for vibrations induced by the movement of the reticle stage or wafer stage during a scan, and thus to prevent flaws in the exposure process due to relative positional errors and thereby enhance the production yield.

REFERENCES:
patent: 4864360 (1989-09-01), Isohata et al.
patent: 6576378 (2003-06-01), Kim
patent: 6743555 (2004-06-01), Jeong et al.
patent: 2003/0035090 (2003-02-01), Imai et al.
patent: 2006/0181672 (2006-08-01), Dong-Il

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