Semiconductor manufacturing method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...

Reexamination Certificate

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C438S770000, C438S773000

Reexamination Certificate

active

07825035

ABSTRACT:
A semiconductor manufacturing method includes purging a growth chamber including a reaction product, a treatment chamber, and a glove box hermetically surrounding the growth chamber, with an inert gas atmosphere. The method also includes transferring the reaction product from the growth chamber to the treatment chamber, followed by moistening the reaction product in the treatment chamber, and extracting the moistened reaction product into the atmosphere.

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patent: 6562143 (2003-05-01), Makishi
patent: 6610612 (2003-08-01), Dagenais et al.
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patent: 7368368 (2008-05-01), Emerson
patent: 2002/0155712 (2002-10-01), Urashima et al.
patent: 2004/0248385 (2004-12-01), Tanaka et al.
patent: 2001-107242 (2001-04-01), None

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