Semiconductor manufacturing apparatus, and positioning jig...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With workpiece support

Reexamination Certificate

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Details

C118S500000, C118S728000, C156S345540, C269S296000, C269S302000, C279S128000, C361S234000

Reexamination Certificate

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06921457

ABSTRACT:
The placement of a wafer can be performed with good positional precision, and the positioning of wafer clamps during maintenance is facilitated. A tapered recess is formed in that portion of the wafer support on which a wafer is placed. When a wafer is placed in the recess, the sloped surface inside this recess comes into contact with the edge of the wafer from beneath the wafer. The wafer is supported in a specific attitude by the sloped surface inside this recess.

REFERENCES:
patent: 6073576 (2000-06-01), Moslehi et al.
patent: 6165276 (2000-12-01), Lu et al.
patent: 05136252 (1993-06-01), None

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