Fluid handling – Processes – Involving pressure control
Reexamination Certificate
2005-08-08
2010-02-09
Lee, Kevin L (Department: 3753)
Fluid handling
Processes
Involving pressure control
C137S557000, C137S487500, C251S026000
Reexamination Certificate
active
07658200
ABSTRACT:
The present invention provides a semiconductor manufacturing apparatus having a slit valve control system including first and second process chambers disposed adjacent to each other, a slit aperture disposed between the first and second chambers, a slit valve to open and close the slit aperture between first and second chambers, an air source to operate the slit valve, a pressure supply flow path connecting the slit valve with the air source, and a pressure regulator installed on the supply flow path to regulate pressure supplied from the air source to the slit valve.
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Choi Jae-Sun
Han Chi-Ho
Jang Ki-Joong
Jung Jin-Su
Lee Kevin L
Samsung Electronics Co,. Ltd.
Volentine & Whitt PLLC
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