Semiconductor manufacturing apparatus

Details Semiconductor manufacturing apparatus Semiconductor manufacturing apparatus

1997-02-12

1998-11-17

Kunemund, Robert

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723R, 1341043, 20429802, 20429831, C23C 1600

Patent

active

058370943

ABSTRACT:
In a semiconductor manufacturing apparatus, the number of fine particles is counted by a particle monitor 15 mounted to a part of an exhaust pipe 12 for exhausting a gas in a process chamber 4, and an end point detection controller 31 observes the count value in time sequence to detect an end point time of plasma etching or plasma cleaning. Further, in a semiconductor manufacturing apparatus, it is possible to calibrate a detection accuracy of the particle monitor with high accuracy.

REFERENCES:
patent: 5083865 (1992-01-01), Kinney et al.
patent: 5271264 (1993-12-01), Chanayem
patent: 5424558 (1995-06-01), Boden et al.
patent: 5525158 (1996-06-01), Tsukazaki et al.

Affiliated with

Also associated with

Rating

Semiconductor manufacturing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor manufacturing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor manufacturing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-880560